Dry Etching for VLSI—A Review
- L.M. Ephrath
- 2019
- JES
Publications
14361 results for Physical Sciences
Titanium Dioxide Films to Improve Photoresist Adhesion
- John C. Marinace
- Ralph C. McGibbon
- 2019
- JES
Silicon Oxidation Studies: Measurement of the Diffusion of Oxidant in SiO2 Films
- E.A. Irene
- 2019
- JES
Anodic Etching of Defects in P-Type Silicon
- H. Föll
- 2019
- JES
AZ1350J as a Deep-U.V. Mask Material
- B.J. Lin
- 2019
- JES
Copolymers of Methyl Methacrylate and Methacrylic Acid and Their Metal Salts as Radiation Sensitive Resists
- Ivan Haller
- Ralph Feder
- et al.
- 2019
- JES
Selective Studies of Chemical Vapor-Deposited Aluminum Nitride-Silicon Nitride Mixture Films
- S. Zirinsky
- E.A. Irene
- 2019
- JES
Controlled Collapse Reflow for Josephson Chip Bonding
- C.-Y. Ting
- K.R. Grebe
- et al.
- 2019
- JES
Effect of Lubricant Environments on Saw Damage in Si Wafers
- T.S. Kuan
- K.K. Shih
- et al.
- 2019
- JES
Effect of Plating Parameters on Electrodeposition of NiFe
- J. Horkans
- 2019
- JES