Picosecond photoelectron microscope for high-speed testing of integrated circuitsP.G. MayY. Pastolet al.1990IBM J. Res. Dev
Surface and interfacial energies of CoSi2 and Si films. Implications regarding formation of three-dimensional silicon-silicide structuresK.N. Tu1990IBM J. Res. Dev
Diamondlike carbon films by rf plasma-assisted chemical vapor deposition from acetyleneA. GrillB.S. Meyersonet al.1990IBM J. Res. Dev
Surface chemistry of the WF6-based chemical vapor deposition of tungstenM.L. YuK.Y. Ahnet al.1990IBM J. Res. Dev
Internal probing of submicron FETs and photoemission using individual oxide trapsP. RestleAntonio Gnudi1990IBM J. Res. Dev
Low-temperature Si and Si:Ge epitaxy by ultrahigh-vacuum/chemical vapor deposition. Process fundamentalsB.S. Meyerson1990IBM J. Res. Dev
Picosecond noninvasive optical detection of internal electrical signals in flip-chip-mounted silicon integrated circuitsH. Heinrich1990IBM J. Res. Dev
Picosecond photoemission probing of integrated circuits. Capabilities, limitations, and applicationsR. ClaubergH. Behaet al.1990IBM J. Res. Dev
Lanthanide gallate perovskite-type substrates for epitaxial, high-Tc superconducting Ba2YCu3O7-δ filmsE.A. GiessR.L. Sandstromet al.1990IBM J. Res. Dev