Publications

3541 results for Mathematical Sciences

Performance of tri-layer process required for 22nm and beyond
- - Yayi Wei
  - Martin Glodde
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Revisit pattern collapse for 14nm node and beyond
- - Kenji Yoshimoto
  - Craig Higgins
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Visualization of the develop process
- - Linda K. Sundberg
  - Gregory M. Wallraff
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Fundamental investigation of Negative Tone Development (NTD) for the 22nm node (and beyond)
- - Guillaume Landie
  - Yongan Xu
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Extending photo-patternable low-κ concept to 193 nm lithography and e-beam lithography
- - Qinghuang Lin
  - Alshakim Nelson
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Self-assembly patterning for sub-15nm half-pitch: A transition from lab to fab
- - Chris Bencher
  - Jeffrey Smith
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Hexafluoroalcohol (HFA) containing molecular resist materials for high resolution lithographic applications
- - Anuja De Silva
  - Linda K. Sundberg
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Integrated model-based retargeting and optical proximity correction
- - Kanak B. Agarwal
  - Shayak Banerjee
- 2011
- SPIE Advanced Lithography 2011
Single exposure contacts are dead. Long live single exposure contacts!
- - Henning Haffner
  - Martin Ostermayr
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Quantitative analysis of parallelism and data movement properties across the Berkeley computational motifs
- - Victoria Caparrós Cabezas
  - Phillip Stanley-Marbell
- 2011
- CF 2011