Bilevel derivative-free optimization and its application to robust optimization
- Andrew R. Conn
- L.N. Vicente
- 2012
- Optimization Methods and Software
Paper
Publications
3602 results for Mathematical Sciences
Process optimization through model based SRAF printing prediction
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- 2012
- SPIE Advanced Lithography 2012
Conference paperEUV mask line edge roughness
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- Emily Gallagher
- et al.
- 2012
- SPIE Advanced Lithography 2012
Conference paperPattern collapse mitigation strategies for EUV Lithography
- Dario L. Goldfarb
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- et al.
- 2012
- SPIE Advanced Lithography 2012
Conference paperLens heating challenges for negative tone develop layers with freeform illumination: A comparative study of experimental vs. simulated results
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- Michael Crouse
- et al.
- 2012
- SPIE Advanced Lithography 2012
Conference paperFast source independent estimation of lithographic difficulty supporting large scale source optimization
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- Maria Gabrani
- et al.
- 2012
- SPIE Advanced Lithography 2012
Conference paperComputing exact Fourier series coefficients of IC rectilinear polygons from low-resolution fast Fourier coefficients
- Robin Scheibler
- Paul Hurley
- 2012
- SPIE Advanced Lithography 2012
Conference paperTrainable convolution filters and their application to face recognition
- Ritwik Kumar
- Arunava Banerjee
- et al.
- 2012
- IEEE TPAMI
PaperConductive layer for charge dissipation during electron-beam exposures
- Luisa D. Bozano
- Ratnam Sooriyakumaran
- et al.
- 2012
- Proceedings of SPIE - The International Society for Optical Engineering 2012
Conference paperDose-focus monitor technique using CD-SEM and application to local variation analysis
- Shoji Hotta
- Timothy Brunner
- et al.
- 2012
- SPIE Advanced Lithography 2012
Conference paper