Reduction of electromigration in aluminum films by copper doping
- Irving Ames
- Francois M. D'Heurle
- et al.
- 2000
- IBM J. Res. Dev
Publications
745 results at IBM J. Res. Dev
Miniaturization of electronics and its limits
- Robert W. Keyes
- 2000
- IBM J. Res. Dev
Future of CMOS technology
- Randall D. Isaac
- 2000
- IBM J. Res. Dev
Low-temperature Si and Si:Ge epitaxy by uitrahigh-vacuum/ chemical vapor deposition: Process fundamentals
- B.S. Meyerson
- 2000
- IBM J. Res. Dev
Picosecond imaging circuit analysis
- James C. Tsang
- Jeffrey A. Kash
- et al.
- 2000
- IBM J. Res. Dev
Atomic resolution analytical microscopy
- P.E. Batson
- 2000
- IBM J. Res. Dev
Custom circuit design as a driver of microprocessor performance
- David H. Allen
- Sang H. Dhong
- et al.
- 2000
- IBM J. Res. Dev
Random-Access Memory Accounting Machine. I. System organization of the IBM 305
- Murray L. Lesser
- John W. Haanstra
- 2000
- IBM J. Res. Dev
Controlled collapse reflow chip joining
- Lewis F. Miller
- 2000
- IBM J. Res. Dev
Plasma-etching processes for ULSI semiconductor circuits
- M. Armacost
- P.D. Hoh
- et al.
- 1999
- IBM J. Res. Dev