Communication technologies for exascale systems
- J.A. Kash
- P. Pepeljugoski
- et al.
- 2009
- SPIE OPTO 2009
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3520 results for Mathematical Sciences
Flexible optical interconnects based on silicon-containing polymers
- Ed Anzures
- Roger Dangel
- et al.
- 2009
- SPIE OPTO 2009
Cr migration on 193nm binary photomasks
- John Bruley
- Geoffrey Burr
- et al.
- 2009
- SPIE Advanced Lithography 2009
Resist-based polarization monitoring with phase-shift masks at 1.35 numerical aperture
- Gregory McIntyre
- Richard Tu
- 2009
- SPIE Advanced Lithography 2009
The measurement uncertainty challenge of advanced patterning development 727203
- Narender Rana
- Chas Archie
- et al.
- 2009
- SPIE Advanced Lithography 2009
Benefits and trade-offs of global source optimization in optical lithography
- Kehan Tian
- Azalia Krasnoperova
- et al.
- 2009
- SPIE Advanced Lithography 2009
A computational technique to optimally design in-situ diffractive elements: Applications to projection lithography at the resist resolution limit
- Gonzalo R. Feijóo
- Jaione Tirapu-Azpiroz
- et al.
- 2009
- SPIE Advanced Lithography 2009
Contact mask optimization and SRAF design
- Uwe P. Schroeder
- Cyrus Tabery
- et al.
- 2009
- SPIE Advanced Lithography 2009
C-Quad polarized illumination for back end thin wire: Moving beyond annular illumination regime
- Sohan Singh Mehta
- Hyung-Rae Lee
- et al.
- 2009
- SPIE Advanced Lithography 2009
Intensive optimization of masks and sources for 22nm lithography
- Alan E. Rosenbluth
- David O. Melville
- et al.
- 2009
- SPIE Advanced Lithography 2009