Hardmask technology for sub-100 nm lithographic imaging
- Katherina Babich
- Arpan P. Mahorowala
- et al.
- 2003
- Microlithography 2003
Conference paper
Publications
9263 results for Computer Science
Failure prediction across process window for robust OPC
- Shumay D. Shang
- Yuri Granik
- et al.
- 2003
- SPIE Advanced Lithography 2003
Conference paperHigh flexibility scalable image coding
- Pascal Frossard
- Pierre Vandergheynst
- et al.
- 2003
- VCIP 2003
Conference paperImpact of thin resist processes on post-etch LER
- Arpan P. Mahorowala
- Dario L. Goldfarb
- et al.
- 2003
- Microlithography 2003
Conference paperDeprotection volume characteristics and line edge morphology in chemically amplified resists
- Ronald L. Jones
- Tengjiao Hu
- et al.
- 2003
- Microlithography 2003
Conference paperHighly etch selective spin-on bottom antireflective coating for use in 193 nm lithography and beyond
- Dirk Pfeiffer
- Arpan Mahorowala
- et al.
- 2003
- Microlithography 2003
Conference paperUsing the critical ionization model for resist development to estimate contrast curves and roughening
- Frances A. Houle
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Conference paperDiffusion induced line edge roughness
- Michael D. Stewart
- Gerard M. Schmid
- et al.
- 2003
- Microlithography 2003
Conference paperReinforcement learning with immediate rewards and linear hypotheses
- Naoki Abe
- Alan W. Biermann
- et al.
- 2003
- Algorithmica (New York)
PaperTopic learning from few examples
- Huaiyu Zhu
- Shivakumar Vaithyanathan
- et al.
- 2003
- PKDD 2003
Conference paper