Leveraging data analytics, patterning simulations and metrology models to enhance CD metrology accuracy for advanced IC nodes
- Narender Rana
- Yunlin Zhang
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paper
Publications
3602 results for Mathematical Sciences
E-beam inspection of EUV mask defects: To etch or not to etch?
- Ravi Bonam
- Hung-Yu Tien
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paperNovel in-line metrology methods for Fin pitch walking monitoring in 14nm node and beyond
- Robin Chao
- Kriti Kohli
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paperCDSEM AFM hybrid metrology for the characterization of gate-all-around silicon nano wires
- Shimon Levi
- Ishai Schwarzband
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paperMolecular glass resists for scanning probe lithography
- Christian Neuber
- Andreas Ringk
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paperTowards electrical testable soi devices using directed self-assembly for fin formation
- Chi Chun Liu
- Cristina Estrada-Raygoza
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paperEstimating pattern sensitivity to the printing process for varying dose/focus conditions for RET development in the sub-22nm era
- Benoit Seguin
- Henri Saab
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paperClosed-loop high-speed 3D thermal probe nanolithography
- Armin W. Knoll
- Michal Zientek
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paperClear sub-resolution assist features for EUV
- Martin Burkhardt
- Greg McIntyre
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paperShort-term forecasting of cloud images using local features
- Wenhui Jiang
- Fei Su
- et al.
- 2013
- ICGIP 2013
Conference paper