High-Dose Implantations of P, As, and Sb in Silicon: A Comparison of Room-Temperature Implantations Followed by a 550°C Anneal and Implantations Conducted at 600°CBilly L. CrowderJohn M. Fairfield1970JES
Growth of Large Single Crystals of Gallium Phosphide from a Stoichiometric MeltS.E. BlumR.J. Chicotka1968JES
Crystal Growth and Electrical Properties of Potassium-Strontium and Potassium-Lead Niobates Containing LanthanumD.F. O'KaneG. Burnset al.1968JES
Phase Diagram of the Pseudo-Binary System Ag2Te-In2Te3 and Semiconducting Properties of AgIn9Te14Ping-Wang ChiangD.F. O'Kaneet al.1967JES
Deposition and Properties of Aluminum Oxide Obtained by Pyrolytic Decomposition of an Aluminum AlkoxideJ.A. Aboaf1967JES