Two complementary methods to characterize long range proximity effects due to develop loading
- Linda K. Sundberg
- Greg M. Wallraff
- et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
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3519 results for Mathematical Sciences
Understanding the trade-offs of thinner binary mask absorbers
- Jaione Tirapu-Azpiroz
- Gregory McIntyre
- et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
Cell blade based H.264 video encoding engine for large scale video surveillance applications
- Ligang Lu
- Brent Paulovicks
- et al.
- 2010
- VCIP 2010
Sparse Markov Net learning with priors on regularization parameters
- Katya Scheinberg
- Irina Rish
- et al.
- 2010
- ISAIM 2010
Stabilizer subsystem codes with spatially local generators
- Sergey Bravyi
- 2010
- ITW 2010
Spatial signature in local overlay measurements - "what CD-SEM can tell us and optical measurements can not"
- Scott Halle
- Daniel Moore
- et al.
- 2010
- SPIE Advanced Lithography 2010
Hybrid reference metrology exploiting patterning simulation
- Narender Rana
- Chas Archie
- 2010
- SPIE Advanced Lithography 2010
Quantum channel capacities
- Graeme Smith
- 2010
- ITW 2010
CD-SEM metrology of spike detection on sub-40 nm contact holes
- Yoshinori Momonoi
- Taro Osabe
- et al.
- 2010
- SPIE Advanced Lithography 2010
3D-AFM enhancement for CD metrology dedicated to lithography sub-28-nm node requirements
- Johann Foucher
- Narender Rana
- et al.
- 2010
- SPIE Advanced Lithography 2010