PECVD Silicon Nitride as a Gate Dielectric for Amorphous Silicon Thin Film Transistor Process and Device Performance
- Yue Kuo
- 1995
- JES
Paper
Publications
509 results at JES
Plasma Etching and Deposition for a-Si: H Thin Film Transistors
- Yue Kuo
- 1995
- JES
PaperScreening of charged electrodes in aqueous electrolytes
- James N. Glosli
- 1995
- JES
PaperLaser-Assisted Seeding for Electroless Plating on Polyimide Surfaces
- A.G. Schrott
- Bodil Braren
- et al.
- 1995
- JES
PaperComposition Determination of NiCo Alloys by the RRDE Method
- P.C. Andricacos
- 1995
- JES
PaperAlloying of a Less Noble Metal in Electrodeposited Cu Through Underpotential Deposition
- Hariklia Deligianni
- I-Chia Hsu Chang
- et al.
- 1995
- JES
PaperCorrosion and Protection of a Conductive Silver Paste
- V. Brusic
- G.S. Frankel
- et al.
- 1995
- JES
PaperX-Ray Absorption Study of Electrochemically Grown Oxide Films on AlCr Sputtered Alloys
- A.J. Davenport
- H.S. Isaacs
- et al.
- 1994
- JES
PaperThin Film Transistors with Graded SiNx Gate Dielectrics
- Yue Kuo
- 1994
- JES
PaperElectrolytic Codeposition of Ni-γAl2O3 Thin Films
- Patrick R. Webb
- Neil L. Robertson
- 1994
- JES
Paper