In-situ X-ray Diffraction study of Metal Induced Crystallization of amorphous silicon
- W. Knaepen
- C. Detavernier
- et al.
- 2008
- Thin Solid Films
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Plasma ash processing solutions for advanced interconnect technology
- N. Fuller
- M.A. Worsley
- et al.
- 2008
- Thin Solid Films
Chemical and structural modifications in a 193-nm photoresist after low-k dry etch
- E. Kesters
- M. Claes
- et al.
- 2008
- Thin Solid Films
Interfacial microstructure of NiSix/HfO2/SiOx/Si gate stacks
- M. Gribelyuk
- C. Cabral Jr.
- et al.
- 2007
- Thin Solid Films
Nanoporous organosilicate films as antireflection coatings
- Koushik Biswas
- Shubhra Gangopadhyay
- et al.
- 2006
- Thin Solid Films
Effect of oxygen at the Cu-SiCxNy interface on electromigration performance of interconnect structures
- E. Liniger
- C. Dziobkowski
- 2006
- Thin Solid Films
Electromigration Cu mass flow in Cu interconnections
- C.-K. Hu
- D. Canaperi
- et al.
- 2006
- Thin Solid Films
Underlayer effects on texture evolution in copper films
- C.E. Murray
- K.P. Rodbell
- et al.
- 2006
- Thin Solid Films
CoSi2 formation in the presence of Ti, Ta or W
- C. Detavernier
- C. Lavoie
- et al.
- 2004
- Thin Solid Films
Evolution of microstructure in Ti-Ta bilayer thin films on polycrystalline-Si and Si(001)
- A.S. Özcan
- K.F. Ludwig Jr.
- et al.
- 2004
- Thin Solid Films