Electrical and EPR Studies of Electrolytically Grown TiO2 (Rutile)
- G.V. Chandrashekhar
- R.S. Title
- 2019
- JES
Paper
Publications
509 results at JES
The Formation of SiO2 in an RF Generated Oxygen Plasma: II. The Pressure Range Above 10 mTorr
- A. Ray
- A. Reisman
- 2019
- JES
PaperPlasma Oxide FET Devices
- A. Ray
- A. Reisman
- 2019
- JES
PaperOn Fitting Error Functions to Data
- R. Ghez
- M.B. Small
- 2019
- JES
PaperAnomalous Etch Structures Using Ethylenediamine-Pyrocatechol-Water Based Etchants and Their Elimination
- A. Reisman
- M. Berkenblit
- et al.
- 2019
- JES
PaperAn electron microscope investigation of the effect of phosphorous doping on the plasma etching of polycrystalline silicon
- E.A. Irene
- E. Tierney
- et al.
- 2019
- JES
PaperThe Formation of SiO2 in an RF Generated Oxygen Plasma: I. The Pressure Range Below 10 mTorr
- A. Ray
- A. Reisman
- 2019
- JES
PaperResolution Limits Of PMMA Resist for Exposure with 50 kV Electrons
- Alec N. Broers
- 2019
- JES
PaperLow Energy Ion Beam Etching
- J.M.E. Harper
- J.J. Cuomo
- et al.
- 2019
- JES
PaperOne-Micron Polycide (WSI2 on Poly-Si) MOSFET Technology
- M.Y. Tsai
- H.H. Chao
- et al.
- 2019
- JES
Paper