Nonphotosensitive, vertically redundant two-channel a-Si:H thin film transistor
- Yue Kuo
- 1996
- JES
Paper
Publications
509 results at JES
Effect of mask wall angle on shape evolution during through-mask electrochemical micromachining
- R.V. Shenoy
- M. Datta
- 1996
- JES
PaperEtching of tantalum in fluorine-containing high density plasmas
- R. Hsiao
- D.C. Miller
- 1996
- JES
PaperRepassivation of pits in aluminum thin films
- G.S. Frankel
- J.R. Scully
- et al.
- 1996
- JES
PaperWettability of polished silicon oxide surfaces
- Richard R. Thomas
- Frank B. Kaufman
- et al.
- 1996
- JES
PaperCorrosion and Protection of a Conductive Silver Paste
- V. Brusic
- G.S. Frankel
- et al.
- 1995
- JES
PaperRepassivation Transients Measured with the Breaking-Electrode Technique on Aluminum Thin-Film Samples
- C.V. Jahnes
- V. Brusic
- et al.
- 1995
- JES
PaperElectrochemical Fabrication of Mechanically Robust PbSn C4 Interconnections
- J. Roeder
- H. Deligianni
- et al.
- 1995
- JES
PaperPECVD Silicon Nitride as a Gate Dielectric for Amorphous Silicon Thin Film Transistor Process and Device Performance
- Yue Kuo
- 1995
- JES
PaperLaser-Assisted Seeding for Electroless Plating on Polyimide Surfaces
- A.G. Schrott
- Bodil Braren
- et al.
- 1995
- JES
Paper