Etching of tantalum in fluorine-containing high density plasmas
- R. Hsiao
- D.C. Miller
- 1996
- JES
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Electromigration drift velocity in Al-alloy and Cu-alloy lines
- C.-K. Hu
- K.Y. Lee
- et al.
- 1996
- JES
Horizontally redundant, split-gate a-Si:H thin film transistors
- Yue Kuo
- 1996
- JES
Nonphotosensitive, vertically redundant two-channel a-Si:H thin film transistor
- Yue Kuo
- 1996
- JES
Repassivation of pits in aluminum thin films
- G.S. Frankel
- J.R. Scully
- et al.
- 1996
- JES
Low Temperature Atmospheric Pressure Chemical Vapor Deposition for Epitaxial Growth of SiGe Bipolar Transistors
- D.A. Grutzmacher
- D.A. Grutzmacher
- 1995
- JES
Alloying of a Less Noble Metal in Electrodeposited Cu Through Underpotential Deposition
- Hariklia Deligianni
- I-Chia Hsu Chang
- et al.
- 1995
- JES
Composition Determination of NiCo Alloys by the RRDE Method
- P.C. Andricacos
- 1995
- JES
Novel fingered stacked capacitor cell
- Tue Nguyen
- S. Nguyen
- et al.
- 1995
- JES
Corrosion and Protection of a Conductive Silver Paste
- V. Brusic
- G.S. Frankel
- et al.
- 1995
- JES