Effect of mask wall angle on shape evolution during through-mask electrochemical micromachining
- R.V. Shenoy
- M. Datta
- 1996
- JES
Publications
509 results at JES
Impact of the electrochemical properties of silicon wafer surfaces on copper outplating from HF solutions
- I. Teerlinck
- P.W. Mertens
- et al.
- 1996
- JES
Wettability of polished silicon oxide surfaces
- Richard R. Thomas
- Frank B. Kaufman
- et al.
- 1996
- JES
Repassivation of pits in aluminum thin films
- G.S. Frankel
- J.R. Scully
- et al.
- 1996
- JES
Horizontally redundant, split-gate a-Si:H thin film transistors
- Yue Kuo
- 1996
- JES
Corrosion and Protection of a Conductive Silver Paste
- V. Brusic
- G.S. Frankel
- et al.
- 1995
- JES
PECVD Silicon Nitride as a Gate Dielectric for Amorphous Silicon Thin Film Transistor Process and Device Performance
- Yue Kuo
- 1995
- JES
Plasma Etching and Deposition for a-Si: H Thin Film Transistors
- Yue Kuo
- 1995
- JES
Screening of charged electrodes in aqueous electrolytes
- James N. Glosli
- 1995
- JES
Composition Determination of NiCo Alloys by the RRDE Method
- P.C. Andricacos
- 1995
- JES