Etching of tantalum in fluorine-containing high density plasmas
- R. Hsiao
- D.C. Miller
- 1996
- JES
Paper
Publications
509 results at JES
Repassivation of pits in aluminum thin films
- G.S. Frankel
- J.R. Scully
- et al.
- 1996
- JES
PaperWettability of polished silicon oxide surfaces
- Richard R. Thomas
- Frank B. Kaufman
- et al.
- 1996
- JES
PaperInvestigation of island formation during through-mask electrochemical micromachining
- R.V. Shenoy
- M. Datta
- et al.
- 1996
- JES
PaperHorizontally redundant, split-gate a-Si:H thin film transistors
- Yue Kuo
- 1996
- JES
PaperComposition Determination of NiCo Alloys by the RRDE Method
- P.C. Andricacos
- 1995
- JES
PaperPECVD Silicon Nitride as a Gate Dielectric for Amorphous Silicon Thin Film Transistor Process and Device Performance
- Yue Kuo
- 1995
- JES
PaperPlasma Etching and Deposition for a-Si: H Thin Film Transistors
- Yue Kuo
- 1995
- JES
PaperScreening of charged electrodes in aqueous electrolytes
- James N. Glosli
- 1995
- JES
PaperNovel fingered stacked capacitor cell
- Tue Nguyen
- S. Nguyen
- et al.
- 1995
- JES
Paper