Effect of mask wall angle on shape evolution during through-mask electrochemical micromachining
- R.V. Shenoy
- M. Datta
- 1996
- JES
Publications
509 results at JES
Etching of tantalum in fluorine-containing high density plasmas
- R. Hsiao
- D.C. Miller
- 1996
- JES
Repassivation of pits in aluminum thin films
- G.S. Frankel
- J.R. Scully
- et al.
- 1996
- JES
Wettability of polished silicon oxide surfaces
- Richard R. Thomas
- Frank B. Kaufman
- et al.
- 1996
- JES
Nonphotosensitive, vertically redundant two-channel a-Si:H thin film transistor
- Yue Kuo
- 1996
- JES
Screening of charged electrodes in aqueous electrolytes
- James N. Glosli
- 1995
- JES
Laser-Assisted Seeding for Electroless Plating on Polyimide Surfaces
- A.G. Schrott
- Bodil Braren
- et al.
- 1995
- JES
Plasma Etching and Deposition for a-Si: H Thin Film Transistors
- Yue Kuo
- 1995
- JES
PECVD Silicon Nitride as a Gate Dielectric for Amorphous Silicon Thin Film Transistor Process and Device Performance
- Yue Kuo
- 1995
- JES
Electrochemical Fabrication of Mechanically Robust PbSn C4 Interconnections
- J. Roeder
- H. Deligianni
- et al.
- 1995
- JES