Nonphotosensitive, vertically redundant two-channel a-Si:H thin film transistor
- Yue Kuo
- 1996
- JES
Paper
Publications
509 results at JES
Wettability of polished silicon oxide surfaces
- Richard R. Thomas
- Frank B. Kaufman
- et al.
- 1996
- JES
PaperImpact of the electrochemical properties of silicon wafer surfaces on copper outplating from HF solutions
- I. Teerlinck
- P.W. Mertens
- et al.
- 1996
- JES
PaperEtching of tantalum in fluorine-containing high density plasmas
- R. Hsiao
- D.C. Miller
- 1996
- JES
PaperInvestigation of island formation during through-mask electrochemical micromachining
- R.V. Shenoy
- M. Datta
- et al.
- 1996
- JES
PaperPECVD Silicon Nitride as a Gate Dielectric for Amorphous Silicon Thin Film Transistor Process and Device Performance
- Yue Kuo
- 1995
- JES
PaperElectrochemical Fabrication of Mechanically Robust PbSn C4 Interconnections
- J. Roeder
- H. Deligianni
- et al.
- 1995
- JES
PaperRepassivation Transients Measured with the Breaking-Electrode Technique on Aluminum Thin-Film Samples
- C.V. Jahnes
- V. Brusic
- et al.
- 1995
- JES
PaperFabrication of an array of precision nozzles by through-mask electrochemical micromachining
- Madhav Datta
- 1995
- JES
PaperComposition Determination of NiCo Alloys by the RRDE Method
- P.C. Andricacos
- 1995
- JES
Paper