Numerical analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithography
- William Hinsberg
- Frances A. Houle
- 2006
- SPIE Advanced Lithography 2006
Conference paper
Publications
14468 results for Physical Sciences
Adhesion between template materials and UV-cured nanoimprint resists
- Frances A. Houle
- Eric Guyer
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperInvestigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
- Patrick P. Naulleau
- Clemens Rammeloo
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperDirect determination of photoresist composition changes during UV exposure
- Frances A. Houle
- Vaughn R. Deline
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperCharacterization of Across-device Linewidth Variation (ADLV) for 65 nm logic SRAM using CDSEM and linewidth roughness algorithms
- W. Chu
- C. Radens
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperDiagonalization methods in PARSEC
- Yousef Saad
- Yunkai Zhou
- et al.
- 2005
- Institute for the Theory of Advanced Materials in Information Technology Workshop on Computational Materials 2005
Conference paperStructural domains in antiferromagnetic LaFeO3thin films
- Jin Won Seo
- Christel Dieker
- et al.
- 2006
- Journal of Materials Research
PaperStructural domains in antiferromagnetic LaFeO3 thin films
- Jin Won Seo
- Christel Dieker
- et al.
- 2006
- Zeitschrift fuer Metallkunde/Materials Research and Advanced Techniques
PaperPhotochemical attachment of reactive cross-linked polymer films to Si/SiO 2 surfaces and subsequent polymer brush growth
- Matthias Beinhoff
- Jane Frommer
- et al.
- 2006
- Chemistry of Materials
PaperA domain decomposition scheme based on equivalence theorem
- Mao-Kun Li
- Weng C. Chew
- et al.
- 2006
- Microwave and Optical Technology Letters
Paper