Motion of W marker during sequential compound formation in bimetallic AlCu thin films
- H.T.G. Hentzell
- R.D. Thompson
- et al.
- 1983
- Materials Letters
Publications
3526 results for Materials Discovery
Chemical bonding and reactions at Ti/Si and Ti/oxygen/Si interfaces
- R. Blitz
- G.W. Rubloff
- et al.
- 1983
- JVSTA
Correlation between the ion bombardment during film growth of Pd films and their structural and electrical properties
- P. Ziemann
- E. Kay
- 1983
- JVSTA
Plasma etching of niobium with CF4/O2 gases
- Mao-Min Chen
- Run Han Wang
- 1983
- JVSTA
Laser-induced gas-surface interactions
- T.J. Chuang
- 1983
- Surface Science Reports
Summary Abstract: Crystallographic structure of coevaporated Ni-Al alloy films
- H.T.G. Hentzell
- B. Andersson
- et al.
- 1983
- JVSTA
Test of structural models for Ag{110}1 2-0 by LEED intensity analysis
- E. Zanazzi
- M. Maglietta
- et al.
- 1983
- JVSTA
Summary Abstract: Preparation and properties of granular aluminum in plasma-polymerized matrices
- M. Hecq
- P. Zieman
- et al.
- 1983
- JVSTA
Vacuum systems for microelectronics
- John F. O’hanlon
- 1983
- JVSTA
Effect of surface chemistry and work function in secondary ion mass spectrometry
- Ming L. Yu
- 1983
- JVSTA