Summary Abstract: Titanium silicide films prepared by reactive sputtering
- V. Deline
- F.M. d’Heurle
- 1985
- JVSTA
Publications
3525 results for Materials Discovery
Reactive sputtering of copper and silicon near the sputtering threshold
- T.M. Mayer
- J.M.E. Harper
- et al.
- 1985
- JVSTA
Summary Abstract: Energy distributions of electronically excited molecules produced by ion bombardment of silicon
- R.E. Walkup
- Ph. Avouris
- 1985
- JVSTA
Summary Abstract: Low temperature adsorption and reaction of O2 with Si(111) 7×7
- A.J. Schell-Sorokin
- J.E. Demuth
- 1985
- JVSTA
Matrix inversion for the GR method in surface scattering
- W.A. Schlup
- 1985
- Surface Science
Summary Abstract: The interaction mechanism of inelastic electron tunneling spectroscopy probed by high resolution electron energy loss spectroscopy
- M. Liehr
- P.A. Thiry
- et al.
- 1985
- JVSTA
Adsorbate-surface and adsorbate-adsorbate interactions and their role in surface reactions
- N.D. Lanq
- 1985
- JVSTA
Formation of TiSi2 and TiN during nitrogen annealing of magnetron sputtered Ti films
- E.D. Adams
- K.Y. Ahn
- et al.
- 1985
- JVSTA
Summary Abstract: High performance packaging in microelectronics
- Albert J. Blodgett
- 1985
- JVSTA
Summary Abstract: Microstructure and electrical conductivity of plasma deposited gold/fluorocarbon composite films
- J. Perrin
- B. Despax
- et al.
- 1985
- JVSTA