Summary Abstract: Titanium silicide films prepared by reactive sputteringV. DelineF.M. d’Heurle1985JVSTAPaper
Possible metal-metal phase transitions, particularly in LiC6G. CampagnoliE. Tosattiet al.1985Synthetic MetalsPaper
Photoemission spectroscopy study of aluminum-polyimide interfaceJ.W. BarthaP.O. Hahrtet al.1985JVSTAPaper
Summary Abstract: Microstructure and electrical conductivity of plasma deposited gold/fluorocarbon composite filmsJ. PerrinB. Despaxet al.1985JVSTAPaper
Why the close-packed Ni(111) surface dissociatively chemisorbs oxygen and nucleates oxide faster than the more open Ni(100) surfaceC.R. Brundle1985JVSTAPaper
Effects of biased cosputtering on resistivity and step coverage in tungsten silicide filmsK.W. ChoiK.Y. Ahn1985JVSTAPaper
Summary Abstract: Resistivity-process relationships in TiSi2 formed from Ti-Si reaction couplesH.-O. BlomS. Berget al.1985JVSTAPaper