Control of Plasma Etch Conditions through Pulsed, Cyclic, and QALE Processes for Advanced Node Applications
- Dominik Metzler
- 2023
- PESM 2023
Publications
24 results for Logic Scaling
A 1.9GHz 0.57V Vmin 576Kb embedded product-ready L2 cache in 5nm FinFET technology
- N. Jungmann
- Rajiv V. Joshi
- et al.
- 2023
- VLSI Technology 2023
TSV Stress Evolution Mapping using in-line Raman Spectroscopy
- Stefan Schoeche
- Daniel Schmidt
- et al.
- 2023
- SPIE Advanced Lithography + Patterning 2023
Next-Generation Logic Design Architecture for Vertical-Transport Nanosheets
- Biswanath (Biswa) Senapati
- Jeongho Do
- et al.
- 2023
- SPIE Advanced Lithography + Patterning 2023