Comprehensive analysis of line-edge and line-width roughness for EUV lithography
- Ravi Bonam
- Chi Chun Liu
- et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paper
Publications
23 results at SPIE Advanced Lithography 2017
Reducing line edge roughness in si and sin through plasma etch chemistry optimization for photonic waveguide applications
- Nathan Marchack
- Marwan Khater
- et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paperPrintability and actinic AIMS review of programmed mask blank defects
- Erik Verduijn
- Pawitter Mangat
- et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paper