High sensitivity photothermal surface spectroscopy with polarization modulationH CoufalF Trägeret al.1984Surface Science
Reactive etching mechanism of tungsten silicide in CF4-O2 plasmaYoung H. LeeMao-Min Chenet al.1984Thin Solid Films
Computer simulation of vacancy migration in a fcc tilt boundaryThomas KwokPaul S. Hoet al.1984Surface Science
Molecular beam studies of the dynamics of activated adsorption of N2 on W(110): Dissociation threshold and new binding statesJ. LeeR.J. Madixet al.1984Surface Science