Reactive sputtering of copper and silicon near the sputtering thresholdT.M. MayerJ.M.E. Harperet al.1985JVSTA
Summary Abstract: High resolution synchrotron photoemission study of silicon-metal interfacesP.S. Ho1985JVSTA
Magnetic susceptibility of SbCl5-graphite intercalation compounds. IIY. YosidaK. Satoet al.1985Synthetic Metals
Why the close-packed Ni(111) surface dissociatively chemisorbs oxygen and nucleates oxide faster than the more open Ni(100) surfaceC.R. Brundle1985JVSTA
Summary Abstract: Microstructure and electrical conductivity of plasma deposited gold/fluorocarbon composite filmsJ. PerrinB. Despaxet al.1985JVSTA
Unoccupied surface state and conduction band critical points of GaP(110): A high resolution inverse photoemission studyD. StraubM. Skibowskiet al.1985JVSTA
Effect of ion bombardment during deposition on the x-ray microstructure of thin silver filmsT.C. HuangG. Limet al.1985JVSTA
Thermal desorption spectroscopy of Xe at the Si(111) as a local probe for surface structuresJ.W. BarthaU. Barjenbruchet al.1985JVSTA