Properties of Cr-N films produced by reactive sputtering
- K.K. Shih
- D.B. Dove
- et al.
- 1986
- JVSTA
Paper
Publications
3555 results for Materials Discovery
Soft X-ray photoemission study of the silicon-fluorine etching reaction
- F.R. McFeely
- J.F. Morar
- et al.
- 1986
- Surface Science
PaperLow temperature material reaction at the Ti/Si(111) interface
- R.M. Tromp
- G.W. Rubloff
- et al.
- 1986
- JVSTA
PaperCatalytic oxidation of niobium by rare earths
- Maria Ronay
- 1986
- JVSTA
PaperEffects of deposition methods on the temperature-dependent resistivity of tunasten films
- L. Krusin-Elbaum
- K.Y. Ahn
- et al.
- 1986
- JVSTA
PaperSummary Abstract: Vibrations of ammonia on the Cu(100) surface
- Ingo Hussla
- Charles W. Bauschlicher
- 1986
- JVSTA
PaperCharacterization of nitrogen-containing glasses by x-ray photoelectron spectroscopy
- G.H. Frischat
- R. Fern
- 1986
- JVSTA
PaperHollow-cathode-enhanced magnetron sputtering
- J.J. Cuomo
- S.M. Rossnagel
- 1986
- JVSTA
PaperSurface processes leading to carbon contamination of photochemically deposited copper films
- F.A. Houle
- R.J. Wilson
- et al.
- 1986
- JVSTA
PaperNanosecond pulsed laser-induced segregation of Te in TeOx films
- W.-Y. Lee
- H. Coufal
- et al.
- 1986
- JVSTA
Paper