Summary Abstract: Theoretical investigations of fluorine-silicon systems
- Chris G. Van de Walle
- Y. Bar-Yam
- et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Publications
358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Use of a scanning tunneling microscope to rectify optical frequencies and measure an operational tunneling time
- A.A. Lucas
- P.H. Cutle
- et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperA scanning tunneling microscopy study of the reaction of si(001)-(2 x 1) with nh3
- R.J. Hamers
- Ph. Avouris
- et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperVoltage-dependent scanning tunneling microscopy imaging of semiconductor surfaces
- Joseph A. Stroscio
- D.M. Newns
- et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperCharacterization of the surface oxidation and magnetic properties of MnFe thin films
- S.L. Cohen
- Michael A. Russak
- et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperX-ray photoemission spectroscopy characterization of silicon surfaces after CF4/H2magnetron ion etching: Comparisons to reactive ion etching
- Gottlieb S. Oehrlein
- Arthur A. Bright
- et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperA time resolved study of velocity distributions in pulsed molecular beams
- Benjamin N. Eldridge
- Ming L. Yu
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperTransient fluorocarbon film thickness effects near the silicon dioxide/silicon interface in selective silicon dioxide reactive ion etching
- Mark A. Jaso
- Gottlieb S. Oehrlein
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperSummary Abstract: Structure analysis of the GaAs(110) surface by scanning tunneling microscopy
- J. Tersoff
- R.M. Feenstra
- et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperTungsten-rhenium alloys as diffusion barriers between aluminum and silicon
- S.-E. Hörnström
- T. Lin
- et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper