Publications

358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Summary Abstract: Atomic force microscopy studies of frictional forces and of force effects in scanning tunneling microscopy
- - C. Mathew Mate
  - Ragnar Erlandsson
  - et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Summary Abstract: Imaging oxygen acceptor states on the GaAs(110) surface
- - Joseph A. Stroscio
  - R.M. Feenstra
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Microstructure of sputtered metal films grown in high and low pressure discharges
- - E. Kay
  - F. Parmigiani
  - et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Low-energy neutral/ion backscattering at As/Si(001)
- - H. Niehus
  - K. Mann
  - et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Phenomena produced by ion bombardment in plasma-assisted etching environments
- - Harold F. Winters
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Tungsten-rhenium alloys as diffusion barriers between aluminum and silicon
- - S.-E. Hörnström
  - T. Lin
  - et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Summary Abstract: Structure analysis of the GaAs(110) surface by scanning tunneling microscopy
- - J. Tersoff
  - R.M. Feenstra
  - et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Transient fluorocarbon film thickness effects near the silicon dioxide/silicon interface in selective silicon dioxide reactive ion etching
- - Mark A. Jaso
  - Gottlieb S. Oehrlein
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A time resolved study of velocity distributions in pulsed molecular beams
- - Benjamin N. Eldridge
  - Ming L. Yu
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
X-ray photoemission spectroscopy characterization of silicon surfaces after CF₄/H₂magnetron ion etching: Comparisons to reactive ion etching
- - Gottlieb S. Oehrlein
  - Arthur A. Bright
  - et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films