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- David O. S. Melville
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paper
Publications
14468 results for Physical Sciences
Intensive optimization of masks and sources for 22nm lithography
- Alan E. Rosenbluth
- David O. Melville
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperHybrid Resist Systems Based on a-Substituted Acrylate Copolymers
- Hiroshi Ito
- Linda K. Sundberg
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperC-Quad polarized illumination for back end thin wire: Moving beyond annular illumination regime
- Sohan Singh Mehta
- Hyung-Rae Lee
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperBenefits and trade-offs of global source optimization in optical lithography
- Kehan Tian
- Azalia Krasnoperova
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperA computational technique to optimally design in-situ diffractive elements: Applications to projection lithography at the resist resolution limit
- Gonzalo R. Feijóo
- Jaione Tirapu-Azpiroz
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperGrowth kinetics of si and ge nanowires
- S. Kodambaka
- J. Tersoff
- et al.
- 2009
- SPIE OPTO 2009
Conference paperGating of a three-leg molecule
- Norton D. Lang
- Paul M. Solomon
- 2009
- ACS Nano
PaperHigh field magneto-optical spectroscopy of highly aligned individual and ensemble single-walled carbon nanotubes
- J. Shaver
- A. Srivastava
- et al.
- 2009
- International Journal of Modern Physics B
PaperDependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C4 F 8 - And CF4 -based discharges
- S. Engelmann
- R. Bruce
- et al.
- 2009
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Paper