On the Temperature Dependence of Majority Carrier Transport in Heavily Arsenic-Doped Polycrystalline Silicon Thin Films
- John D. Cressler
- Wei Hwang
- et al.
- 2019
- JES
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A Three-Layer Resist System for Deep U.V. and RIEMicrolithography on Nonplanar Surfaces
- E. Bassous
- G. Pepper
- et al.
- 2019
- JES
Current status of reduced temperature silicon epitaxy by chemical vapor deposition
- B.S. Meyerson
- 2019
- JES
A TEM Study of the Effect of Accelerators on Pd-Sn Colloidal Catalysts and on the Initiation of Electroless Cu Deposition on Epoxy
- Jean Horkans
- Jungihl Kim
- et al.
- 2019
- JES
Reactive Ion Etching of GaAs in Chlorine and Resulting Surface Damage
- B.S. Lee
- H. Baratte
- 2019
- JES
Reactive Ion Etching in SF6 Gas Mixtures
- R. Pinto
- R.S. Babu
- 2019
- JES
The effect of organometallic structure
- Thomas H. Baum
- 2019
- JES
Conducting Transition Metal Oxides: Possibilities for RuO2in VLSI Metallization
- L. Krusin-Elbaum
- M. Wittmer
- 2019
- JES
Oxide Passivation of Photochemically Unpinned GaAs
- C.W. Wilmsen
- Alan C. Warren
- et al.
- 2019
- JES
Thermally Developable, Positive Resist Systems with High Sensitivity
- Hiroshi Ito
- Reinhold Schwalm
- 2019
- JES