Effects of deuterium plasma treatments on the electrical properties of boron-doped silicon
- A. Henry
- O.O. Awadelkarim
- et al.
- 1989
- Materials Science and Engineering B
Publications
3526 results for Materials Discovery
Competitive reactions of fluorine and oxygen with W, WSi2, and Si surfaces in reactive ion etching using CF4/O2
- Gottlieb S. Oehrlein
- J. Lennart Lindsöm
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
TIN formed by ion beam nitriding of TiSi2
- S.E. Harnstrarn
- D. Moy
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Large bearing numbers and stationary reynolds roughness
- C. Greengard
- 1989
- Journal of Tribology
Reactive magnetron sputtered zirconium oxide and zirconium silicon oxide thin films
- Michael A. Russak
- Christopher V. Jahnes
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Plasma-enhanced CVD of high quality insulating films
- J. Batey
- E. Tierney
- et al.
- 1989
- Applied Surface Science
Optical emission in magnetrons: Nonlinear aspects
- S.M. Rossnagel
- K.L. Saenger
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Bilayers with chromium disilicide: Chromium-vanadium
- T.G. Finstad
- O. Thomas
- et al.
- 1989
- Applied Surface Science
Thin-film topography control with transient liquid underlayer
- Igor Y. Khandros
- Robert J. Baseman
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
interface states and Schottky barrier formation at metal/GaAs junctions
- R.E. Viturrc
- C. Mailhiot
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films