TIN formed by ion beam nitriding of TiSi2
- S.E. Harnstrarn
- D. Moy
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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- Materials Discovery
3488 results for Materials Discovery
Silicon hydride etch products from the reaction of atomic hydrogen with Si(100)
- Stephen M. Gates
- Roderick R. Kunz
- et al.
- 1989
- Surface Science
Competitive reactions of fluorine and oxygen with W, WSi2, and Si surfaces in reactive ion etching using CF4/O2
- Gottlieb S. Oehrlein
- J. Lennart Lindsöm
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Plasma characterization for a divergent field electron cyclotron resonance source
- John Forster
- William Holber
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Electron spin resonance study of metal-nitride-silicon structures: Observation of Si dangling bonds with different configurations and trapping properties in silicon nitride
- D. Jousse
- Jerzy Kanicki
- et al.
- 1989
- Applied Surface Science
Mechanisms for success or failure of diffusion barriers between aluminum and silicon
- J.M.E. Harper
- S.E. Harnstram
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Effects of deuterium plasma treatments on the electrical properties of boron-doped silicon
- A. Henry
- O.O. Awadelkarim
- et al.
- 1989
- Materials Science and Engineering B
Nucleation of new solid phases from chemical interactions at an interface
- F.M. Heurle
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Coulombic and neutral electron trapping centers in SiO2
- D.A. Buchanan
- M.V. Fischetti
- et al.
- 1989
- Applied Surface Science
Mechanical effects in peel adhesion test
- J. Kim
- K.S. Kim
- et al.
- 1989
- Journal of Adhesion Science and Technology