Post-exposure bake as a process-control parameter for chemically-amplffied photoresist
- John L. Sturtevant
- Steven J. Holmes
- et al.
- 1993
- Microlithography 1993
Conference paper
Publications
3605 results for Mathematical Sciences
Process optimization of APEX-E
- Karen Petrillo
- 1993
- Microlithography 1993
Conference paperOptimal estimation of linear operators from inaccurate data: A second look
- Charles A. Micchelli
- 1993
- Numerical Algorithms
PaperMonge and feasibility sequences in general flow problems
- Ilan Adler
- Alan J. Hoffman
- et al.
- 1993
- Discrete Applied Mathematics
PaperIrredundancy in circular arc graphs
- Martin Charles Golumbic
- Renu C. Laskar
- 1993
- Discrete Applied Mathematics
PaperCovering the complete graph with plane cycles
- Alan Hartman
- Yoav Medan
- 1993
- Discrete Applied Mathematics
PaperComputational materials science for microelectronics - the old and the new challenges
- Sokrates T. Pantelides
- 1993
- Physica D: Nonlinear Phenomena
PaperDynamics of the Ge(111)c(2 × 8) surface studied by scanning tunneling microscopy
- R.M. Feenstra
- G.A. Held
- 1993
- Physica D: Nonlinear Phenomena
PaperPhotoresist process latitude optimization for synchrotron x-ray lithography
- Andrew T. Pomerene
- David E. Seeger
- et al.
- 1993
- Microlithography 1993
Conference paperFully-scaled 0.25-micron bipolar technology using variable shaped electron-beam lithography
- Philip J. Coane
- Kaolin G. Chiong
- et al.
- 1993
- Microlithography 1993
Conference paper