Roughness and porosity characterization of carbon and magnetic films through adsorption isotherm measurements
- C.L. Wang
- M.F. Toney
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
Date
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- Materials Discovery
3488 results for Materials Discovery
Reaction kinetics of surface silicon hydrides
- C. Michael Greenlief
- Stephen M. Gates
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The physics of hot-electron degradation of Si MOSFET's: Can we understand it?
- M.V. Fischetti
- S.E. Laux
- et al.
- 1989
- Applied Surface Science
Structure of the Si(111)/CaF2 interface
- R.M. Tromp
- M.C. Reuter
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Effect of oxygen on the electrical transport in RuO2
- L. Krusin-Elbaum
- 1989
- Thin Solid Films
A He and Ne diffraction study of the W(100) phase transition
- E. Schweizer
- C.T. Rettner
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Plasma characterization of an electron cyclotron resonance-radio-frequency hybrid plasma reactor
- Young H. Lee
- John E. Heidenreich
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Some properties of CrxV1-xSi2 and CrxMo1-xSi2 thin films
- O. Thomas
- Steve Molis
- et al.
- 1989
- Applied Surface Science
The nature of the dominant deep trap in amorphous silicon nitride films: Evidence for a negative correlation energy
- P. Lenahan
- D.T. Krick
- et al.
- 1989
- Applied Surface Science
Gate materials consideration for submicron CMOS
- C.-Y. Ting
- B. Davari
- 1989
- Applied Surface Science