The importance of free radical recombination reactions in CF4 /02 plasma etching of silicon
- K.F. Jensen
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Publications
3555 results for Materials Discovery
Ta as a barrier for the Cu/PtSi, Cu/Si, and Al/PtSi structures
- Chin-An Chang
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperChemistry and adhesion of metal-polymer interfaces
- P.S. Ho
- 1990
- Applied Surface Science
PaperAdhesion of polyimides to metal and ceramic surfaces: An overview
- L.P. Buchwalter
- 1990
- Journal of Adhesion Science and Technology
PaperNucleation controlled phase selection in vanadium/amorphous silicon multilayer thin films
- R.R. de Avillez
- E. Ma
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperNanomechanics of a Au-lr contact using a bidirectional atomic force microscope
- Sidney R. Cohen
- Gabi Neubauer
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperSurface diffractometry and lattice imaging of scanning tunneling microscopy images
- J.E. Demuth
- R.J. Hamers
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperScanning tunneling microscopy and spectroscopy of thin metal films on the GaAs(110) surface
- P. Martensson
- R.M. Feenstra
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper(100) and (111) Ni films epitaxially grown on Cu by the metal-metal epitaxy on silicon technique near room temperatures
- Chin-An Chang
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperThe physical description of films coating quartz resonators
- K.Keiji Kanazawa
- 1990
- Thin Solid Films
Paper