In situ plasma contamination measurements by HeNe laser light scattering: A case study
- J.S. Mckillop
- Kurt L. Haller
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Publications
3556 results for Materials Discovery
Sputtered tungsten for deep submicroncomplementary metal-oxide-semiconductor technology
- L. Dori
- A.C. Megdanis
- et al.
- 1990
- Thin Solid Films
PaperProperties of diamond structure SnGe films grown by molecular beam epitaxy
- Alex Harwit
- P.R. Pukite
- et al.
- 1990
- Thin Solid Films
PaperDefect microchemistry in Si02/Si structures
- G.W. Rubloff
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperProperties of W-N and Mo-N films prepared by reactive sputtering
- K.K. Shih
- D.B. Dove
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperSurface photovoltage on Si(111)-(7x7) probed by optically pumped scanning tunneling microscopy
- R.J. Hamers
- K. Markert
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperIon temperature gradient driven turbulence in the weak density gradient limit
- Satoshi Hamaguchi
- Wendell Horton
- 1990
- Physics of Fluids B
PaperComposition and structure of boron nitride films deposited by chemical vapor deposition from borazine
- J. Kouvetakis
- V.V. Patel
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperReactive ion etching of silicon using bromine containing plasmas
- Tim D. Bestwick
- Gottlieb S. Oehrlein
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperEquilibrium surface hydrogen coverage during silicon epitaxy using SiH4
- C.M. Greenlief
- M. Offenberg
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper