Publications

358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Gas/surface reactions in the chemical vapor deposition of tungsten using WF6/SiH4mixtures
- - Ming L. Yu
  - Benjamin N. Eldridge
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Scanning tunneling microscopy study of low-temperature epitaxial growth of silicon on sI(111 )-(7×7)
- - U.K. Köhler
  - J.E. Demuth
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Molecular-beam studies of the precursor-mediated dissociative chemisorption of N2 on W(100)
- - C.T. Rettner
  - E. Schweizer
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
A study of voids in sputtered Si02
- - Mitchell J. Hait
  - Harris C. Jones
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Optical emission characterization of a divergent magnetic field electron cyclotron resonance source
- - John S. McKillop
  - John C. Forster
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Determination of the local electronic structure of atomic-sized defects on Si(001) by tunneling spectroscopy
- - R.J. Hamers
  - U.K. Köhler
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Reaction kinetics of surface silicon hydrides
- - C. Michael Greenlief
  - Stephen M. Gates
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
The chemical interaction of Mn with the MoS2(0001) surface studied by high-resolution photoelectron spectroscopy
- - Jeffrey R. Lince
  - Thomas B. Stewart
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Competitive reactions of fluorine and oxygen with W, WSi2, and Si surfaces in reactive ion etching using CF4/O2
- - Gottlieb S. Oehrlein
  - J. Lennart Lindsöm
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Mechanisms for success or failure of diffusion barriers between aluminum and silicon
- - J.M.E. Harper
  - S.E. Harnstram
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper