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- 2010
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14468 results for Physical Sciences
Toward perfect on-wafer pattern placement: Stitched overlay exposure tool characterization
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- Timothy A. Brunner
- et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paperOverlay characterization and matching of immersion photoclusters
- Blandine Minghetti
- Timothy Brunner
- et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paperDemonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
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- Alan E. Rosenbluth
- et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paperPredicting and reducing substrate induced focus error
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- Brian Sapp
- et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paperSpacer defined double patterning for sub-72 nm pitch logic technology
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- Erin McLellan
- et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paperThe feasibility of using image parameters for test pattern selection during OPC model calibration
- Amr Abdo
- Ramya Viswanathan
- 2010
- SPIE Advanced Lithography 2010
Conference paperOrganocatalysis: Opportunities and challenges for polymer synthesis
- Matthew K. Kiesewetter
- Eun Ji Shin
- et al.
- 2010
- Macromolecules
ReviewSynthesis and size-dependent crystallization of colloidal germanium telluride nanoparticles
- Marissa A. Caldwell
- Simone Raoux
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- Journal of Materials Chemistry
PaperDomain-wall spin-torque resonators for frequency-selective operation
- S. Lepadatu
- O. Wessely
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- 2010
- Physical Review B - CMMP
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