Interdiffusion in copper-aluminum thin film bilayers. I. Structure and kinetics of sequential compound formation
- H.T.G. Hentzell
- R.D. Thompson
- et al.
- 1983
- Journal of Applied Physics
Publications
2360 results at Journal of Applied Physics
Interaction of Pd-Er alloys with silicon
- G. Ottaviani
- K.N. Tu
- et al.
- 1983
- Journal of Applied Physics
Frequency doubling in a LiNbO3 thin film deposited on sapphire
- G.H. Hewig
- K. Jain
- 1983
- Journal of Applied Physics
Thermal generation of confocal domains in a smectic a liquid crystal
- N.J. Chou
- S.W. Depp
- et al.
- 1983
- Journal of Applied Physics
Silicon etching mechanism and anisotropy in CF4+O2 plasma
- Young H. Lee
- Mao-Min Chen
- 1983
- Journal of Applied Physics
Thermal stability of Pb-alloy Josephson junction electrode materials. VII. Concentration range of single ε-phase Pb-Bi films used in counterelectrodes
- Masanori Murakami
- H.-C.W. Huang
- et al.
- 1983
- Journal of Applied Physics
Degradation of thin tellurium films
- Wen-Yaung Lee
- R.H. Geiss
- 1983
- Journal of Applied Physics
Intermetallic compound formation in thin-film and in bulk samples of the Ni-Si binary system
- K.N. Tu
- G. Ottaviani
- et al.
- 1983
- Journal of Applied Physics
Temperature dependence of structural and electrical properties of Ta-Si thin alloy films
- T. Tien
- G. Ottaviani
- et al.
- 1983
- Journal of Applied Physics
The preparation of in situ doped hydrogenated amorphous silicon by homogeneous chemical vapor deposition
- B.S. Meyerson
- B.A. Scott
- et al.
- 1983
- Journal of Applied Physics