Formation and crystallization of amorphous silicides at the interface between thin metal and amorphous silicon filmsS.R. HerdK.Y. Ahnet al.1983Thin Solid Films
Atomic motion of dopant during interfacial silicide formationM. WittmerC.-Y. Tinget al.1983Thin Solid Films
ZrN diffusion barrier in aluminum metallization schemesL. Krusin-ElbaumM. Wittmeret al.1983Thin Solid Films
Ellipsometry and reflection, luminescence and Raman spectroscopies of monolayer assemblies on solid substratesW. KnollJ. Rabeet al.1983Thin Solid Films
Rapid writing of fine lines in Langmuir-Blodgett films using electron beamsA.N. BroersM. Pomerantz1983Thin Solid Films
General aspects of barrier layers for very-large-scale integration applications I: ConceptsP.S. Ho1982Thin Solid Films
The use of titanium-based contact barrier layers in silicon technologyC.-Y. TingM. Wittmer1982Thin Solid Films