Low-temperature deposition of high-quality silicon dioxide by plasma-enhanced chemical vapor deposition
- J. Batey
- E. Tierney
- 1986
- Journal of Applied Physics
Paper
Publications
2360 results at Journal of Applied Physics
Optical ranging by wavelength multiplexed interferometry
- C.C. Williams
- H.K. Wickramasinghe
- 1986
- Journal of Applied Physics
PaperPhase transformations in alloy and bilayer thin films of vanadium and silicon
- F. Nava
- P.A. Psaras
- et al.
- 1986
- Journal of Applied Physics
PaperResistivity of AuIn2+δ thin films
- A.A. Bright
- J.T. Wetzel
- 1986
- Journal of Applied Physics
PaperA study of CClF3/H2 reactive ion etching damage and contamination effects in silicon
- X.C. Mu
- S.J. Fonash
- et al.
- 1986
- Journal of Applied Physics
PaperThermal stability of TiSi2 on mono- and polycrystalline silicon
- C.Y. Wong
- L.K. Wang
- et al.
- 1986
- Journal of Applied Physics
PaperMorphology and kinetics of crystallization of amorphous V75Si25 thin-alloy films
- F. Nava
- B.Z. Weiss
- et al.
- 1986
- Journal of Applied Physics
PaperPtSi contact metallurgy: Comparison of different annealing sequences, annealing time and ambients, and deposition techniques of Pt
- Chin-An Chang
- 1986
- Journal of Applied Physics
ReviewFerromagnetic resonance studies in the bilayer system Ni 0.80Fe0.20/Mn0.50Fe0.50
- J.C. Scott
- 1985
- Journal of Applied Physics
PaperEffects of substrate crystallinity and dopant on the growth kinetics of platinum silicides
- H. Takai
- P.A. Psaras
- et al.
- 1985
- Journal of Applied Physics
Paper