Reactive Ion Etching of GaAs in Chlorine and Resulting Surface Damage
- B.S. Lee
- H. Baratte
- 2019
- JES
Paper
Publications
509 results at JES
Redeposition during Deep Trench Etching
- Jacob Jorne
- 2019
- JES
PaperEpitaxial Growth and Selectivity of AlxGa1-xAs Using Novel Metalorganic Precursors
- M.S. Goorsky
- T.F. Kuech
- et al.
- 2019
- JES
PaperVarious Properties of Sputter-Deposited HfB2 Films
- J.M. Eldridge
- A.R. Forouhi
- et al.
- 2019
- JES
PaperInterface Properties of Hydrogenated Amorphous Carbon Films on Ge(100) Surfaces
- M. Wittmer
- D. Ugolini
- et al.
- 2019
- JES
PaperPlasma Etching of Silicon in SF6: Experimental and Reactor Modeling Studies
- Yeong-Jyh Lii
- Jacob Jorné
- et al.
- 2019
- JES
PaperNovel Polymeric Dissolution Inhibitor for the Design of Sensitive, Dry Etch Resistant, Base-Developable Resist
- Hiroshi Ito
- Elizabeth Flores
- et al.
- 2019
- JES
PaperDefect Clustering and Boron Electrical Deactivation in P-Doped Polycrystalline Diamond Films
- Dario Narducci
- C. Richard Guarnieri
- et al.
- 2019
- JES
PaperReactive ion Etching of Silicon and Silicon Dioxide in CF4 Plasmas Containing H2 or C2F4 Additives
- J.P. Simko
- 2019
- JES
PaperElectroactive properties of polyaromatic molecules
- Joachim Bargon
- A. Diaz
- 2019
- JES
Paper