Electrical Properties of AI/Ti Contact Metallurgy for VLSI Applications
- C.-Y. Ting
- B.L. Crowder
- 2019
- JES
Publications
509 results at JES
Stripping Voltammetry of Nickel-Iron Films Electrodeposited on Platinum Using a Rotating Ring-Disk Electrode
- J. Tabib
- L. Romankiw
- 2019
- JES
Conducting Transition Metal Oxides: Possibilities for RuO2in VLSI Metallization
- L. Krusin-Elbaum
- M. Wittmer
- 2019
- JES
Oxide Passivation of Photochemically Unpinned GaAs
- C.W. Wilmsen
- Alan C. Warren
- et al.
- 2019
- JES
Principal Component Analysis of Optical Emission Spectroscopy and Mass Spectrometry: Application to Reactive Ion Etch Process Parameter Estimation Using Neural Networks
- Reza Shadmehr
- David Angell
- et al.
- 2019
- JES
X-Ray Absorption Study of Electrochemically Grown Oxide Films on Al-Cr Sputtered Alloys: I. Ex situ Studies
- A.J. Davenport
- H.S. Isaacs
- et al.
- 2019
- JES
Investigation of Reactive-Ion-Etching-Related Fluorocarbon Film Deposition onto Silicon and a New Method for Surface Residue Removal
- G.S. Oehrlein
- J.G. Clabes
- et al.
- 2019
- JES
Surface Physics in Silicon Molecular Beam Epitaxy
- F.J. Himpsel
- J.F. Morar
- et al.
- 2019
- JES
The Polycrystalline-Si Contact to GaAs
- P.D. Kirchner
- J.M. Woodall
- et al.
- 2019
- JES
PtSi-Induced Junction Leakage
- J.P. Gambino
- M.D. Monkowski
- et al.
- 2019
- JES