Formation and stability of NiSi in the presence of Co and Fe alloying elements
- D. Deduytsche
- C. Detavernier
- et al.
- 2008
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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168 results at Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Metal-containing release layers for use with UV-cure nanoimprint lithographic template materials
- F.A. Houle
- S. Raoux
- et al.
- 2008
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperEffects of film reoxidation on the growth and material properties of ultrathin dielectrics grown by rapid thermal nitridation in ammonia
- C. D'Emic
- J.S. Newbury
- et al.
- 2008
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperStudies of fluorocarbon film deposition and its correlation with etched trench sidewall angle by employing a gap structure using C4F 8Ar and CF4/H2 based capacitively coupled plasmas
- Li Ling
- X. Hua
- et al.
- 2008
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperAdaptive wiring for 20 nm scale epitaxial silicon Ohmic contacts to silicon nanowires
- M.J. Rooks
- G.M. Cohen
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperAre extreme ultraviolet resists ready for the 32 nm node?
- Karen Petrillo
- Yayi Wei
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperMeasurements of acid generation by extreme ultraviolet irradiation in lithographic films
- Martin Glodde
- Dario L. Goldfarb
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperCreation of sub-20-nm contact using diblock copolymer on a 300 mm wafer for complementary metal oxide semiconductor applications
- Wai-Kin Li
- Sam Yang
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperEffects of pore morphology on the diffusive properties of a porous low- κ dielectric
- E. Joseph
- S.P. Sant
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperAdhesion between template materials and UV-cured nanoimprint resists
- F.A. Houle
- Eric Guyer
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Paper