Publications

176 results at JVSTA

Extending the compositional diversity of films in area selective atomic layer deposition through chemical functionalities
- - Magi Mettry
  - Alexander E. Hess
  - et al.
- 2019
- JVSTA
Achieving ultrahigh etching selectivity of SiO₂ over Si₃N₄ and Si in atomic layer etching by exploiting chemistry of complex hydrofluorocarbon precursors
- - Kang Yi Lin
  - Chen Li
  - et al.
- 2018
- JVSTA
Review Article: Stress in thin films and coatings: Current status, challenges, and prospects
- - Grégory Abadias
  - Eric Chason
  - et al.
- 2018
- JVSTA
Effects of cesium ion implantation on the mechanical and electrical properties of porous SiCOH low- k dielectrics
- - Weiyi Li
  - Dongfei Pei
  - et al.
- 2017
- JVSTA
Cyclic Cl₂/H₂ quasi-atomic layer etching approach for TiN and TaN patterning using organic masks
- - Nathan Marchack
  - J. M. Papalia
  - et al.
- 2017
- JVSTA
Effects of ultraviolet and vacuum ultraviolet synchrotron radiation on organic underlayers to modulate line-edge roughness of fine-pitch poly-silicon patterns
- - Hiroyuki Miyazoe
  - Sebastian U. Engelmann
  - et al.
- 2017
- JVSTA
Early example of an interdisciplinary approach in industry: Harold F. Winters's contributions
- - Eric Kay
  - John W. Coburn
- 2017
- JVSTA
Atomic layer deposited ultrathin metal nitride barrier layers for ruthenium interconnect applications
- - Sonal Dey
  - Kai-Hung Yu
  - et al.
- 2017
- JVSTA
Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low T_e plasma sources
- - Ashish Jagtiani
  - Hiroyuki Miyazoe
  - et al.
- 2016
- JVSTA
Application of cyclic fluorocarbon/argon discharges to device patterning
- - Dominik Metzler
  - Kishore Uppireddi
  - et al.
- 2016
- JVSTA