High performance extremely thin SOI (ETSOI) hybrid CMOS with Si channel NFET and strained SiGe channel PFETK. ChengA. Khakifiroozet al.2012IEDM 2012
Statistical measurement of random telegraph noise and its impact in scaled-down high-κ/metal-gate MOSFETsH. MikiN. Tegaet al.2012IEDM 2012
Scalable and fully self-aligned n-type carbon nanotube transistors with gate-all-aroundAaron D. FranklinSiyuranga O. Koswattaet al.2012IEDM 2012