Publications

23 results at SPIE Advanced Lithography 2017

Fundamentals of EUV resist-inorganic hardmask interactions
- - Dario Goldfarb
  - Martin Glodde
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Silicon photonics and challenges for fabrication
- - N. Feilchenfeld
  - Karen Nummy
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Investigation of alternate mask absorbers in EUV lithography
- - Martin Burkhardt
- 2017
- SPIE Advanced Lithography 2017
Driving down defect density in composite EUV patterning film stacks
- - Luciana Meli
  - Karen Petrillo
  - et al.
- 2017
- SPIE Advanced Lithography 2017
An OCD perspective of line edge and line width roughness metrology
- - Ravi Bonam
  - R. Muthinti
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle
- - Cheng Chi
  - Chi Chun Liu
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Unexpected impact of RIE gases on lithographic films
- - Martin Glodde
  - Robert L. Bruce
  - et al.
- 2017
- SPIE Advanced Lithography 2017
DSA patterning options for logics and memory applications
- - Chi Chun Liu
  - Elliott Franke
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Development of TiO₂ containing hardmasks through PEALD deposition
- - Anuja De Silva
  - Indira Seshadri
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Advanced fast 3D DSA model development and calibration for design technology co-optimization
- - Kafai Lai
  - Balint Meliorisz
  - et al.
- 2017
- SPIE Advanced Lithography 2017