Resistivity of copper interconnects at 28 nm pitch and copper cross-sectional area below 100 nm2Adam PyzynaHsinyu Tsaiet al.2017IITC 2017
Cobalt/copper composite interconnects for line resistance reduction in both fine and wide linesTakeshi NogamiRaghuveer Patlollaet al.2017IITC 2017
Planarity considerations in SADP for advanced BEOL patterningJames H.-C. ChenTerry A. Spooneret al.2017IITC 2017