Electromigration and resistivity in on-chip Cu, Co and Ru damascene nanowiresC. K. HuJames Kellyet al.2017IITC 2017
Resistivity of copper interconnects at 28 nm pitch and copper cross-sectional area below 100 nm2Adam PyzynaHsinyu Tsaiet al.2017IITC 2017
Cobalt/copper composite interconnects for line resistance reduction in both fine and wide linesTakeshi NogamiRaghuveer Patlollaet al.2017IITC 2017