Fabrication and Mobility Characteristics of Ultra-thin Strained Si Directly on Insulator (SSDOI) MOSFETsK. RimK.K. Chanet al.2003IEDM 2003
20 nm N + abrupt junction formation in Strained Si/Si 1-xGe x MOS deviceK.L. LeeF. Cardoneet al.2003IEDM 2003
Highly Manufacturable 40-50 GHz VCOs in a 120nm System-on-Chip SOI TechnologyJonghae KimJean-Olivier Plouchartet al.2003IEDM 2003
Simulation of quantum electronic transport in small devices: A Master equation approachM.V. FischettiS.E. Lauxet al.2003IEDM 2003