Publications

12 results at VLSI Technology 2009

Reduction of RTA-driven intra-die variation via model-based layout optimization
- - J.C. Scott
  - O. Gluschenkov
  - et al.
- 2009
- VLSI Technology 2009
Increasing threshold voltage variation due to random telegraph noise in FETs as gate lengths scale to 20 nm
- - N. Tega
  - H. Miki
  - et al.
- 2009
- VLSI Technology 2009