Publications

21 results at SPIE Advanced Lithography 2009

Benefits and trade-offs of global source optimization in optical lithography
- - Kehan Tian
  - Azalia Krasnoperova
  - et al.
- 2009
- SPIE Advanced Lithography 2009
A computational technique to optimally design in-situ diffractive elements: Applications to projection lithography at the resist resolution limit
- - Gonzalo R. Feijóo
  - Jaione Tirapu-Azpiroz
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Hybrid Resist Systems Based on a-Substituted Acrylate Copolymers
- - Hiroshi Ito
  - Linda K. Sundberg
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Contact mask optimization and SRAF design
- - Uwe P. Schroeder
  - Cyrus Tabery
  - et al.
- 2009
- SPIE Advanced Lithography 2009
C-Quad polarized illumination for back end thin wire: Moving beyond annular illumination regime
- - Sohan Singh Mehta
  - Hyung-Rae Lee
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Intensive optimization of masks and sources for 22nm lithography
- - Alan E. Rosenbluth
  - David O. Melville
  - et al.
- 2009
- SPIE Advanced Lithography 2009
22 nm technology node active layer patterning for planar transistor devices
- - Ryoung-Han Kim
  - Steven Holmes
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Source optimization for three-dimensional image designs through film stacks
- - David O. S. Melville
  - Alan E. Rosenbluth
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- - Kafai Lai
  - Alan E. Rosenbluth
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Overcoming the challenges of 22-nm node patterning through litho-design co-optimization
- - Martin Burkharde
  - J.C. Arnold
  - et al.
- 2009
- SPIE Advanced Lithography 2009