Effect of temperature on electrical and microstructural changes of coevaporated Ir-Si alloy films
- B.Z. Weiss
- K.N. Tu
- et al.
- 1986
- Journal of Applied Physics
Paper
Publications
2360 results at Journal of Applied Physics
Electron heating studies in silicon dioxide: Low fields and thick films
- D.J. DiMaria
- M.V. Fischetti
- et al.
- 1986
- Journal of Applied Physics
PaperComment on "Misfit stress in InGaAs/InP heteroepitaxial structures grown by vapor-phase epitaxy" (Journal of Applied Physics (1985) 57 (249))
- I.C. Noyan
- Armin Segmüller
- 1986
- Journal of Applied Physics
PaperDisilicide solid solutions, phase diagram, and resistivities. I. TiSi 2-WSi2
- P. Gas
- F.J. Tardy
- et al.
- 1986
- Journal of Applied Physics
PaperA reinvestigation of the etch products of silicon and XeF2: Doping and pressure effects
- F.A. Houle
- 1986
- Journal of Applied Physics
PaperEffect of thermal and solution history on the Curie point of VF 2-TrFE random copolymers
- Jennifer S. Green
- Barry L. Farmer
- et al.
- 1986
- Journal of Applied Physics
PaperX-ray structures and magnetic properties of sputtered osmium-doped iron oxide thin films
- G. Lim
- T.C. Huang
- et al.
- 1986
- Journal of Applied Physics
PaperA simple method to determine the pretilt angle of nematic guest-host liquid crystals
- K.H. Yang
- Hiap Liew Ong
- et al.
- 1986
- Journal of Applied Physics
PaperCross-sectional transmission electron microscopy investigation of Ti/Si reaction on phosphorus-doped polycrystalline silicon gate
- C.Y. Wong
- F.S. Lai
- et al.
- 1986
- Journal of Applied Physics
PaperNear-field optical-scanning microscopy
- U. Dürig
- D. Pohl
- et al.
- 1986
- Journal of Applied Physics
Paper