Formation of intermediate phases, Ni3Si2 and Pt 6Si5: Nucleation, identification, and resistivity
- P. Gas
- F.M. D'Heurle
- et al.
- 1986
- Journal of Applied Physics
Publications
2357 results at Journal of Applied Physics
Stability of oxides grown on tantalum silicide surfaces
- A. Cros
- K.N. Tu
- 1986
- Journal of Applied Physics
Rutherford backscattering studies of plasma-etched silicon
- Gottlieb S. Oehrlein
- 1986
- Journal of Applied Physics
SiO2-induced substrate current and its relation to positive charge in field-effect transistors
- Z.A. Weinberg
- M.V. Fischetti
- et al.
- 1986
- Journal of Applied Physics
Theory of thin-film orientation by ion bombardment during deposition
- R. Mark Bradley
- James M. E. Harper
- et al.
- 1986
- Journal of Applied Physics
Interactions between Au and Cu across a Ni barrier layer
- Chin-An Chang
- 1986
- Journal of Applied Physics
Doping dependence of the schottky-barrier height of ti-pt contacts to n-gallium arsenide
- R.F. Broom
- H.P. Meier
- et al.
- 1986
- Journal of Applied Physics
The measurement of effective complex refractive indices for selected metal silicides
- R.D. Frampton
- E.A. Irene
- et al.
- 1986
- Journal of Applied Physics
Oxygen precipitation retardation and recovery phenomena in Czochralski silicon: Experimental observations, nuclei dissolution model, and relevancy with nucleation issues
- T.Y. Tan
- C.Y. Kung
- 1986
- Journal of Applied Physics
Oxidation temperature dependence of the dc electrical conduction characteristics and dielectric strength of thin Ta2O5 films on silicon
- G.S. Oehrlein
- 1986
- Journal of Applied Physics