Silicon etching mechanisms in a CF4/H2 glow discharge
- Gottlieb S. Oehrlein
- Holly L. Williams
- 1987
- Journal of Applied Physics
Publications
Date
Featured collections
Popular topics
2355 results at Journal of Applied Physics
Plasma chemical aspects of magnetron ion etching with CF4/O 2
- A.A. Bright
- S. Kaushik
- et al.
- 1987
- Journal of Applied Physics
Line-broadening analysis of synchrotron x-ray diffraction data
- T.C. Huang
- M. Hart
- et al.
- 1987
- Journal of Applied Physics
Temperature dependence of the magnetic 1/f noise in Eu0.4Sr 0.6S (invited)
- R.H. Koch
- W. Reim
- et al.
- 1987
- Journal of Applied Physics
Schottky-barrier behavior of a Ti-W alloy on Si(100)
- M.O. Aboelfotoh
- 1987
- Journal of Applied Physics
Magnetic and structural properties of high rate dual ion-beam sputtered NiFe films (invited)
- Jerry Lo
- C. Hwang
- et al.
- 1987
- Journal of Applied Physics
Generation and annealing of defects in silicon dioxide
- A. Reisman
- C.K. Williams
- et al.
- 1987
- Journal of Applied Physics
Silane pyrolysis rates for the modeling of chemical vapor deposition
- Bernard S. Meyerson
- Joseph M. Jasinski
- 1987
- Journal of Applied Physics
Oriented growth of ultrathin tungsten films on sapphire substrates
- J.H. Souk
- Armin Segmüller
- et al.
- 1987
- Journal of Applied Physics
Effect of polycrystalline sublayer films on the magnetic and structural properties of CoCr films
- J.K. Howard
- R. Ahlert
- et al.
- 1987
- Journal of Applied Physics