Plasma chemical aspects of magnetron ion etching with CF4/O 2
- A.A. Bright
- S. Kaushik
- et al.
- 1987
- Journal of Applied Physics
Paper
Publications
2360 results at Journal of Applied Physics
In situ resistivity measurement of cobalt silicide formation
- G. Ottaviani
- K.N. Tu
- et al.
- 1987
- Journal of Applied Physics
PaperInhomogeneous carbon bonding in hydrogenated amorphous carbon films
- A. Grill
- B.S. Meyerson
- et al.
- 1987
- Journal of Applied Physics
PaperKinetics of laser-induced chemical vapor deposition of gold
- T.T. Kodas
- T.H. Baum
- et al.
- 1987
- Journal of Applied Physics
PaperOptical self-regulation during laser-induced oxidation of copper
- L. Baufay
- F.A. Houle
- et al.
- 1987
- Journal of Applied Physics
PaperMagnetic and structural properties of high rate dual ion-beam sputtered NiFe films (invited)
- Jerry Lo
- C. Hwang
- et al.
- 1987
- Journal of Applied Physics
PaperEffect of interface states on the electrical properties of W, WSi x, and WAlx Schottky contacts on GaAs
- A.C. Callegari
- D. Ralph
- et al.
- 1987
- Journal of Applied Physics
PaperElectrical transport properties of transition-metal disilicide films
- F. Nava
- K.N. Tu
- et al.
- 1987
- Journal of Applied Physics
PaperNonalloyed ohmic contacts to n-GaAs by solid-phase epitaxy of Ge
- E.D. Marshall
- B. Zhang
- et al.
- 1987
- Journal of Applied Physics
PaperSilane pyrolysis rates for the modeling of chemical vapor deposition
- Bernard S. Meyerson
- Joseph M. Jasinski
- 1987
- Journal of Applied Physics
Paper