Chemically amplified resists: Past, present, and future
- Hiroshi Ito
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Publications
3547 results for Mathematical Sciences
Polymer platform dependent characteristics of 193 nm photoresists
- Juliann Opitz
- R.D. Allen
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Aerial image contrast using interferometric lithography: Effect on line-edge roughness
- M.I. Sanchez
- W.D. Hinsberg
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography
- Zhijian G. Lu
- Yuping Cui
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Molecular weight tailoring in methacrylate 193 nm photoresists
- Thomas I. Wallow
- P.J. Brock
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
NMR analysis of chemically amplified resist films
- Hiroshi Ito
- M.H. Sherwood
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Experimental method for quantifying acid diffusion in chemically amplified resists
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Use of the Gibbs sampler to invert large, possibly sparse, positive definite matrices
- David A. Harville
- 1999
- Linear Algebra and Its Applications
Assessing the registration of CT-scan data to intra-operative X-rays by fusing X-rays and preoperative information
- A. Gueziec
- 1999
- Proceedings of SPIE - The International Society for Optical Engineering
3D visualization of the scoliotic spine: longitudinal studies, data acquisition, and radiation dosage constraints
- A.D. Kalvin
- R. Adler
- et al.
- 1999
- SPIE Medical Imaging 1999