Kinetics of physical adsorption of ethane on lr(110)-(1 × 2): Molecular beam reflectivity measurements and Monte Carlo simulations
- W.H. Weinberg
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
Date
Featured collections
Popular topics
357 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A study of modified polyimide surfaces as related to adhesion
- D-Y. Shih
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Molecular beam studies of trapping dynamics
- W.H. Weinberg
- C.B. Mullins
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Lateral dopant profiling on a 100 nm scale by scanning capacitance microscopy
- C.C. Williams
- J. Slinkman
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Atomic structure of alkali metal overlayers on the Si(001) surface
- Inder P. Batra
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Equilibrium surface hydrogen coverage during silicon epitaxy using SiH4
- C.M. Greenlief
- M. Offenberg
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
X-ray photoelectron spectroscopy and ellipsometry studies of the electrochemically controlled adsorption of benzotriazole on copper surfaces
- S.L. Cohen
- V. Brusic
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Microstructure of yttria-stabilized zirconia overcoats for thin film recording media
- C. Hwang
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
High rate radio frequency sputtering using in-phase plasma confinement
- James E. Lucy
- John Costable
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Molecular-beam study of gas-surface chemistry in the ion assisted etching of silicon with atomic and molecular hydrogen and chlorine
- J.W. Coburn
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films